Patent · US Expired

Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof

US4272620A · kind A · utility

39Cited by
0References
10Claims
0Family size

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Key dates

Filing dateJul 31, 1979
Grant dateJun 9, 1981
Priority date
Expiry dateJul 31, 1999

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31699
  • WIPO fieldBiotechnology
  • WIPO sectorChemistry

Abstract

A hydrophilic resin comprising a polyvinyl alcohol polymeric backbone and containing styrylpyridinium groups is a photosensitive resin. The photosensitive resin is prepared by reacting a styrylpyridinium salt containing a formyl or acetal group with a polyvinyl alcohol compound.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.