Method of producing material patterns by evaporating material through a perforated mask having a reinforcing bridge
US4273812A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Feb 1, 1979 |
| Grant date | Jun 16, 1981 |
| Priority date | — |
| Expiry date | Feb 1, 1999 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/042
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of producing material patterns in which at least one substrate is fixed together with a mask to a substrate holder, and an evaporated film of desired substances is formed on the surface of the substrate by means of evaporation sources provided to confront the substrate. The mask is fabricated to have a plurality of reinforcing bridges formed in the desired portions of the mask openings of desired shape formed in the mask. The mask is held spaced from the substrate by a small distance during the evaporation, so that the evaporation may be effected at least through two pattern openings defined at both sides of each bridge. The evaporation is performed by means of evaporation sources which are located such that the line interconnecting one of the edges of each bridge and the evaporation source located at the same side with respect to the substantial bridging direction of the bridge and another line interconnecting the other edge of the bridge and the evaporation source located at the same side as the other edge intersect each other at a point on the surface of the substrate or in the clearance between the substrate surface and the mask. This method makes it possible to produc…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.