Vacuum deposition system and method
US4274936A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Apr 30, 1979 |
| Grant date | Jun 23, 1981 |
| Priority date | — |
| Expiry date | Apr 30, 1999 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A large scale vacuum deposition facility is disclosed in which substrates, in the form of architectural glass lights on supporting racks, are moved through an evacuated working chamber system where the substrates are coated by cathodic sputtering. The substrate racks are moved by a conveyor system through the working chamber system via an access chamber system, enabling substantially continuous production of coated substrates without requiring the working chamber system be opened to atmosphere. Operation of the working chamber system, the access chamber system, the conveyor system and associated components is monitored and governed from a process control console.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.