Dielectric gas mixture containing trifluoronitromethane and/or trifluoromethanesulfonyl fluoride
US4275260A · kind A · utility
2Cited by
3References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 4, 1979 |
| Grant date | Jun 23, 1981 |
| Priority date | — |
| Expiry date | Sep 4, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01B3/56
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A relatively low-cost dielectric gas mixture including a halogenated hydrocarbon such as CC1.sub.2 F.sub.2, subject to carbonization in the presence of an electrical discharge, and a minor portion of CF.sub.3 NO.sub.2 or CF.sub.3 SO.sub.2 F which suppresses carbonization of the halogenated hydrocarbon.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.