Patent · US Expired

Method of scrubbing acid gases from gas mixtures

US4279872A · kind A · utility

1Cited by
3References
7Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 10, 1979
Grant dateJul 21, 1981
Priority date
Expiry dateSep 10, 1999

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC10K1/143
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A process for scrubbing acid gases, especially carbon dioxide, from gas mixtures with an aqueous amine solution serving as the scrubbing liquid in which hexamethylene diamine serves as the amine. The concentration of the hexamethylene diamine in the aqueous solution is 5 to 40% by weight, preferably 25 to 35% by weight.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.