Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization
US4279986A · kind A · utility
4Cited by
5References
5Claims
0Family size
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Key dates
| Filing date | Jul 23, 1979 |
| Grant date | Jul 21, 1981 |
| Priority date | — |
| Expiry date | Jul 23, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/118
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic resist for use in microfabrication comprising a negative-type resist containing a radical scavenger capable of preventing post-irradiation reaction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.