Method for surface treatment of phosphor particles
US4287229A · kind A · utility
36Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 5, 1979 |
| Grant date | Sep 1, 1981 |
| Priority date | — |
| Expiry date | Nov 5, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2993
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Disclosed is a method for surface treatment of phosphor particles which comprises forming a continuous film of silicon dioxide on the surface of each phosphor particle by treating the phosphor particle with a solution containing an aqueous solution of organic alkali and silicon dioxide dissolved therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.