Negative-working polymers useful as electron beam resists
US4289842A · kind A · utility
6Cited by
10References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 27, 1980 |
| Grant date | Sep 15, 1981 |
| Priority date | — |
| Expiry date | Jun 27, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/40
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Novel acrylate copolymer materials function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.