Heat developable photosensitive material
US4291120A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 15, 1980 |
| Grant date | Sep 22, 1981 |
| Priority date | — |
| Expiry date | Feb 15, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/165
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A heat developable photosensitive material having two or more layers superimposed on a support and containing at least (a) an organic silver salt, (b) a photocatalyst and (c) a reducing agent in one or more such layers, at least one said layers containing (d) a polymer having a repeating unit of the formula: ##STR1## wherein R is a hydrogen atom or a lower alkyl group; and X is a hydrogen atom, or one to three groups selected from the group consisting of a halogen atom, a nitro group, a cyano group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylsulfonyl group, an aryloxy group, an acyl group, an acyloxy group and an acylamido group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.