Dual beam photometer with rotating filter plate
US4291985A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Feb 4, 1980 |
| Grant date | Sep 29, 1981 |
| Priority date | — |
| Expiry date | Feb 4, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/474
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A photometer comprising a light source, a rotating plate provided with a plurality of filter means having different wave lengths, a reference plate and a sample means, said rotating plate disposed between said light source and said reference plate and sample means, and a half-mirror and a reflection plate located between said light source and said rotating plate, said half-mirror and reflection plate being disposed so as to form a first light passage adapted to extend to the reference plate, and a second light passage adapted to extend to the sample means, whereby alternate radiation through one of said filter means against the reference plate and the sample means is made by the rotation of said rotary plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.