Water-based photoresists using stilbene compounds as crosslinking agents
US4299910A · kind A · utility
7Cited by
9References
16Claims
0Family size
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Key dates
| Filing date | Nov 24, 1980 |
| Grant date | Nov 10, 1981 |
| Priority date | — |
| Expiry date | Nov 24, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Improved aqueous photoresist compositions comprising a water-soluble polymeric material and a photosensitive cross-linking agent, therefore, having the formula: ##STR1## wherein, A and B are independently amino or nitro and M is an alkali metal or ammonium ion, and process of exposing and developing same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.