XeCl Avalanche discharge laser employing Ar as a diluent
US4301425A · kind A · utility
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4Claims
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Assignee
Inventor
Key dates
| Filing date | Oct 10, 1979 |
| Grant date | Nov 17, 1981 |
| Priority date | — |
| Expiry date | Oct 10, 1999 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.