Detection of subsurface defects by reflection interference
US4302108A · kind A · utility
35Cited by
11References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 29, 1979 |
| Grant date | Nov 24, 1981 |
| Priority date | — |
| Expiry date | Jan 29, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8901
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process for detecting defects in a multiply layered light transmitting structure, comprising illuminating the surface of the structure with a beam of light at an angle of incidence to the structure at which at least a portion of the beam will be reflected, and detecting the intensity of the reflected beam to locate subsurface as well as surface anomalies in the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.