Optical micrometer measuring system
US4303340A · kind A · utility
Inventor
Key dates
| Filing date | Jun 26, 1979 |
| Grant date | Dec 1, 1981 |
| Priority date | — |
| Expiry date | Jun 26, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/04
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical micrometer measuring system adapted to gauge minute distances between spaced points on an object under test and to indicate the results in digital terms. The system includes a compound microscope having a stage for supporting the object, the object being illuminated and being focused by an objective onto a real image plane to produce an aerial object image which is viewable in magnified form by an operator through an eyepiece. Associated with the microscope is a projector which creates an illuminated image of a pointer, optical means being provided to superimpose the pointer image over the aerial object image. Operatively coupled to the projector is a micrometer controllable by the operator to translate the pointer image between any two points of interest on the object image. The distance travelled by the pointer image is digitally indicated by an analog-to-digital read-out coupled to the micrometer to provide the desired reading.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.