Patent · US Expired

Apparatus and method for selective electrochemical etching

US4303482A · kind A · utility

24Cited by

9References

11Claims

0Family size

Assignee

International Business Machines Corporation · US

Inventors

Joachim Buhne · Heimsheim, DE
Rolf Schafer
Axel Stoffel · Wildberg, DE

Key dates

Filing date	Apr 25, 1980
Grant date	Dec 1, 1981
Priority date	—
Expiry date	Apr 25, 2000

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S204/09
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

An apparatus and method for selectively electrochemically etching a surface is described. The use of the apparatus and the related method allows the establishment of etched planar surface which may be inclined with respect to the original surface. The apparatus has a cathode and multiple connectors which attach to the workpiece whose surface is to be etched. When the apparatus is operated the potential of the connectors are set so that the cathode is at least as negative as the lowest potential of the connectors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.