Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
US4306010A · kind A · utility
24Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 1980 |
| Grant date | Dec 15, 1981 |
| Priority date | — |
| Expiry date | May 28, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/023
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonylchloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as resorcinol with a benzaldehyde, an acetophenone, or a benzophenone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.