Photosensitive composite and photosensitive lithographic printing plate
US4306011A · kind A · utility
25Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 28, 1980 |
| Grant date | Dec 15, 1981 |
| Priority date | — |
| Expiry date | May 28, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G8/28
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A photosensitive composition useful for making a photosensitive lithographic printing plate are made from a condensation product of sulfonyl chloride of o-benzoquinone diazide or o-naphthoquinone diazide and a polyhydric phenol resin obtained by condensing a polyhydric phenol such as 2-methyl resorcinol with an aldehyde or ketone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.