Asymmetrical radiation exposure of spin coated photoresist to obtain uniform thickness coating used to replicate spiral grooves in plastic substrate
US4306013A · kind A · utility
12Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1980 |
| Grant date | Dec 15, 1981 |
| Priority date | — |
| Expiry date | Mar 10, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B3/56
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved method for replicating a spiral groove pattern. The pattern is recorded in a photoresist layer which is then developed to reproduce the pattern in the photoresist layer. The pattern is transferred to a metal layer and formed in the surface of a plastic substrate. The improvement comprises the additional steps of asymmetrically irradiating the photoresist layer and removing the irradiated photoresist surface layer to produce a photoresist layer of uniform thickness.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.