Induction plasma system
US4306175A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 29, 1980 |
| Grant date | Dec 15, 1981 |
| Priority date | — |
| Expiry date | Feb 29, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An induction plasma system includes a plasma chamber, a high frequency electrical coil that surrounds the chamber, and an oscillator for energizing the coil to establish a plasma maintaining condition in the chamber. The oscillator tank circuit includes the coil, and is tuned so that it is essentially at resonance when a plasma condition is established in the chamber. Ignition means is arranged for initiating a plasma condition, and is constructed such that insertion of the ignition means into the chamber in the absence of a plasma condition shifts the impedance condition in the chamber to essentially the same tuned condition that exists when a plasma condition is established in the plasma chamber, but without need to adjust any component of the tank circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.