Uniform light exposure of positive photoresist for replicating spiral groove in plastic substrate
US4308337A · kind A · utility
25Cited by
11References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 10, 1980 |
| Grant date | Dec 29, 1981 |
| Priority date | — |
| Expiry date | Mar 10, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B3/56
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An improved method for replicating a spiral groove pattern. The pattern is recorded in a photoresist layer which is then developed to reproduce the pattern in the photoresist layer. The pattern is transferred to a metal layer and formed in the surface of a plastic substrate. The improvement comprises the additional steps of uniformly irradiating the photoresist layer and removing the irradiated photoresist surface layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.