Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
US4308368A · kind A · utility
64Cited by
3References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 14, 1980 |
| Grant date | Dec 29, 1981 |
| Priority date | — |
| Expiry date | Mar 14, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Photosensitive compositions which contain as a photosensitive resin prepared by the condensation of the co-condensated novolak resin of the mixture of phenols such as in a combination of tert-butyl (or tert-octyl) phenol and phenol and/or cresol and formaldehyde, with o-quinonediazido sulfonic (or carboxylic) acid or contain said novolak resin as an additive for a photosensitive o-quinonediazido compound are discosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.