Apparatus for thermal treatment of semiconductors
US4309961A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 24, 1980 |
| Grant date | Jan 12, 1982 |
| Priority date | — |
| Expiry date | Mar 24, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
As used in an apparatus for thermal treatment of semiconductors, a treating tube has a flanged portion at one end, near an outlet for a treating gas, and a sealing closure has a cylindrical portion and a flanged portion. The flanged portion of the sealing closure is adapted to be interfitted with the flanged portion of the treating tube so as to seal said end. The sealing closure is removable so as to open said end. The cylindrical portion is adapted to be inserted into the treating tank through said end so as to substantially fill the treating tube, as far as the cylindrical portion extends into the tube, except for a clearance provided around the cylindrical portion, between the cylindrical portion and the treating tube, whereby formation of convection currents in the treating gas is prevented. The flanged portion of the treating tube, a hollow interior of the sealing closure, and the flanged portion of the sealing closure are open to an outer atmosphere when the flanged portions are interfitted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.