Axial flow gas cleaning device
US4311494A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1979 |
| Grant date | Jan 19, 1982 |
| Priority date | — |
| Expiry date | Dec 3, 1999 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB04C2003/006
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention is a device which provides for separation of contaminants from a relatively high velocity stream of gas. The invention provides a first stage wherein the gas stream is decelerated and the contaminant particles are caused to separate from the air stream by interacting with a first surface. The interaction results in the particles to acquire a radial velocity vector and by virtue of the momentum of the contaminants particles. The contaminant particles are forced to the outer layer of the gas stream. The second stage of separation provides for further magnification of the radial velocity vector and also induces a slight tangential velocity component to the contaminant particle. By impacting the contaminants against a vane mounted within the gas stream, the contaminant particles, as a result of this impact, acquire a slight swirl or circular motion which causes the contaminant particles to be more localized. In the next stage of the cleaning device, the gas stream is rapidly accelerated by decreasing the area through which the gas stream must travel. This increase in velocity of the gas stream increases the separation for the smaller contaminant particles until a final se…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.