Apparatus for thermal treatment of semiconductors
US4312294A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 24, 1980 |
| Grant date | Jan 26, 1982 |
| Priority date | — |
| Expiry date | Mar 24, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In an apparatus for thermal treatment of semiconductors in a treating gas, a cylindrical plug extends into a treating tube so as to substantially fill the treating tube, as far as the cylindrical plug extends into the treating tube, except for a clearance provided around the cylindrical plug, between the cylindrical plug and the treating tube, whereby formation of convection currents in the treating gas is prevented. The cylindrical plug may be separate from a sealing closure, integral with the sealing closure, or integral with the treating tube. If integral with the treating tube, the cylindrical plug has a tubular portion and a bottom portion, which plugs the tubular portion but is removable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.