Patterned multi-layer structure and manufacturing method
US4313648A · kind A · utility
62Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 1978 |
| Grant date | Feb 2, 1982 |
| Priority date | — |
| Expiry date | Apr 27, 1998 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02C7/107
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A patterned multi-layer structure for a stripe filter used for a photoelectric pickup tube, comprises a protective layer preventing a substrate from being etched by reactive sputter etching and a multi-layer optical filter formed on the protective layer patterned by reactive sputter etching into a stripe pattern. The etching rate of the protective layer by an etching gas agent is not greater than that of the multi-layer filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.