Method for making electron sensitive negative resist
US4315067A · kind A · utility
4Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1980 |
| Grant date | Feb 9, 1982 |
| Priority date | — |
| Expiry date | Jul 9, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymerized resin capable, upon electronic irradiation, of undergoing a cross-linking completing the polymerization and rendering it insoluble in certain solvents. Such a negative resin is ten times more sensitive to electrons than the best known resin. It is obtained by copolymerization of an epithiopropylmethacrylate: ##STR1## and of a vinyl monomer such as methyl methacrylate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.