Mask alignment for semiconductor processing
US4315692A · kind A · utility
6Cited by
8References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 29, 1980 |
| Grant date | Feb 16, 1982 |
| Priority date | — |
| Expiry date | Oct 29, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/0016
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A high power microscope is fitted with a gas jet arrangement for blowing a thin flexible mask into local contact with a semiconductor substrate so as to facilitate mask alignment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.