High gel rigidity, negative electron beam resists
US4318976A · kind A · utility
29Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1980 |
| Grant date | Mar 9, 1982 |
| Priority date | — |
| Expiry date | Oct 27, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0388
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative, high energy radiation resist based on styrene-allyl methacrylate copolymers and substitutional modifications thereof, yielding a linear copolymer with highly sensitive allyl pendant groups together with a thermally stable, solvent resistant backbone. This resist exhibits improved e-beam sensitivity without the attendant problems of swelling during development and flow during heat processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.