Fabrication of palladium anode for X-ray lithography
US4319967A · kind A · utility
9Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 1979 |
| Grant date | Mar 16, 1982 |
| Priority date | — |
| Expiry date | Nov 1, 1999 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S205/917
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A fabrication process for making palladium-plated target anodes for X-ray lithographic systems is characterized by a unique sequence of surface preparation, plating and annealing steps. Anodes made by the process have been operated reliably at high-power levels for extended periods of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.