Method of manufacturing the substrate of an electrochromic display cell
US4320190A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Dec 4, 1980 |
| Grant date | Mar 16, 1982 |
| Priority date | — |
| Expiry date | Dec 4, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/153
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides a method of manufacturing the substrate of an electrochromic display cell as a result of which the ionic conductor of the cell cannot come into contact with the transparent conductive elements which form part of this substrate. A transparent conductive layer, a layer of an electrochromic material and a layer of photosensitive material having a positive action are deposited in turn on a transparent plate. A network of conductive elements is formed by etching away the electrochromic layer and the conductive layer through a mask constituted by the photosensitive material which is selectively exposed and developed. The electrochromic material is then etched away through a second mask formed by the same photosensitive material selectively exposed and developed a second time. This second mask is also used for the deposition of a layer of dielectric material. The conductive elements are thus covered with a continuous layer of dielectric material and of electrochromic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.