Ultra-high frequency device for depositing thin films on solids
US4320716A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 16, 1980 |
| Grant date | Mar 23, 1982 |
| Priority date | — |
| Expiry date | May 16, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/511
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A device having means for forming a high frequency excitation zone in an elongated enclosure, a vacuum pump whose connection is positioned at one end of the enclosure, a device permitting the injection into the enclosure of a gaseous mixture containing at least one compound of the substance to be deposited in the vicinity of but outside the excitation zone. The solid on which the deposit is to be made is positioned in the enclosure. The deposition area on said solid is limited to an area of the enclosure outside the high frequency excitation zone in which the gaseous mixture is almost completely decomposed by high energy particles emitted in said zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.