Photosensitive compositions containing polyamides acid with photosensitive groups
US4321319A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 22, 1980 |
| Grant date | Mar 23, 1982 |
| Priority date | — |
| Expiry date | May 22, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0387
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is described photosensitive polymer composition and a polyimide film-coated material made by applying the composition to a support, irradiating with ultraviolet and thereafter heating. The photosensitive polymer composition is prepared by adding a sensitizer to a photosensitive polyamide acid intermediate solution which is obtained by reacting in an inert solvent a first compound comprising 100 to 5% by weight of a photosensitive group-containing diamine and 0 to 95% by weight of a diamine having no photosensitive group, with a second compound comprising at least one compound selected from a tetracarboxylic acid dianhydride and a tricarboxylic acid anhydride monohalide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.