Susceptor for heating semiconductor substrates
US4322592A · kind A · utility
535Cited by
8References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 22, 1980 |
| Grant date | Mar 30, 1982 |
| Priority date | — |
| Expiry date | Aug 22, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An integral graphite susceptor of the barrel type comprising a hollow polyhedron arranged to support one or more semiconductor substrates on its outer planar wall surfaces. The substrates are supported in a novel column and row array in which each wafer is mounted on a wall surface portion that is related to the other adjacent wall surface portions in an equilateral triangular configuration to provide an efficient substrate support susceptor. Wafer edges extending beyond corners of the susceptor cause a disturbance in the gas flow resulting in more uniform deposition of epitaxial material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.