Patent · US Expired

Producing a silicon carbide structure and multidirectional silicon carbide texture

US4325930A · kind A · utility

6Cited by
7References
5Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 30, 1980
Grant dateApr 20, 1982
Priority date
Expiry dateDec 30, 2000

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/10
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The method for producing a silicon carbide structure comprises the stages of immersing the carbon structure into a bath containing 20 to 40% by weight of silicon powder in suspension in a liquid medium containing 10 to 30% by weight of fugitive resin, the remainder being constituted by a resin solvent, and of drying the structure in order to obtain an easy-to-handle carbon structure coated with resin and silicon powder bonded in the resin. The structure is then subjected to a heat treatment to let the silicon react with the carbon and produce a silicon carbide structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.