Electrically photosensitive materials and elements for photoelectrophoretic imaging processes
US4331751A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 1980 |
| Grant date | May 25, 1982 |
| Priority date | — |
| Expiry date | Nov 17, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G17/04
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Electrically photosensitive materials and elements comprising an electrically photosensitive polymeric compound of the structure: ##STR1## wherein: R.sub.1 and R.sub.3, which are the same or different, represent a substituted or unsubstituted alkyl group having from 1 to 18 carbon atoms or a substituted or unsubstituted aryl group; PA1 R.sub.2 and R.sub.4, which are the same or different, represent a substituted or unsubstituted alkylene group having from 1 to 10 carbon atoms or a substituted or unsubstituted arylene group; PA1 R.sub.5 and R.sub.6, which are the same or different, represent hydrogen or an electron withdrawing group; PA1 R.sub.7 and R.sub.8, which are always different, represent oxy, imino, thio, carbonyloxy, oxycarbonyl, iminocarbonyl, carbonyldioxy, ureylene, carbonyloxycarbonyl, sulfonyl, iminosulfonyl, iminocarbonyloxy, piperidine-1,4-diyl and 1-carbonylpiperidine-1,4-diyl; PA1 Ar is an unsubstituted or a substituted arylene group wherein said substituent is an electron donating group or an electron withdrawing group; PA1 a and d are 0 or 1; PA1 b and c are whole numbers of from 1 to 25; and PA1 n is a whole number having a value of at least 2.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.