Patent · US Expired

Assembly for processing a photosensitive material

US4332454A · kind A · utility

15Cited by
4References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 1981
Grant dateJun 1, 1982
Priority date
Expiry dateJan 9, 2001

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03D5/065
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An applicator assembly used in a processor for processing a photosensitive material with a developer liquid, in which an oscillating applicator supports and contacts an open-celled scrubber pad. The developing fluid is pumped through an adapter onto the applicator, which has a plurality of perforations at its front surface contacting the scrubber pad. The developer fluid is distributed through the scrubber pad which serves as a manifold to the surface to be developed and cleans from it unhardened emulsion of the photosensitive material, which passes the scrubber pad, inserted between it and a transport belt. There are provided means to prevent any shift between the applicator and the scrubber pad which might appear due to the oscillating movement of the applicator assembly transverse to the guide motion of the transport belt, which advances the photosensitive material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.