Particulate thin film fabrication process
US4332838A · kind A · utility
Inventor
Key dates
| Filing date | Sep 24, 1980 |
| Grant date | Jun 1, 1982 |
| Priority date | — |
| Expiry date | Sep 24, 2000 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/935
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for the fabrication of large surface area thin films of vaporizable solids upon substrate materials is provided. The method is particularly applicable to the fabrication of thin films having semiconducting properties useful as solar cells, in the production of microelectronic devices, and other similar purposes. A solid material is vaporized in a temperature-zoned furnace in association with a flowing carrier gas. The vaporized solid is allowed to condense to form an aerosol of disperse sized particles; the smaller of these particles are again vaporized leaving a lesser number of seed aerosol nuclei which are then grown to a larger size and diverted through an orifice to impact upon a substrate moving beneath the orifice thereby forming a particulate film on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.