Apparatus for producing selective particle sized oxide
US4335080A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 1980 |
| Grant date | Jun 15, 1982 |
| Priority date | — |
| Expiry date | Jan 7, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/62
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A plasma method and apparatus produce oxide particles having average diameters determined by adjustment of process conditions. Feed material is fed into a dual chamber reaction zone in which a plasma environment is established to cause the feed material to be vaporized. Subsequently, effluent containing the vaporized feed from the reaction zone is passed into a quenching zone where it is subjected to a quenching medium, the volume, velocity and direction of which are adjustable to determine output particle size characteristics. Feed material may be an oxide per se or one which forms an oxide in situ through reduction and/or oxidation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.