Methods for controlling vapor concentrations in an atmosphere
US4337582A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 30, 1980 |
| Grant date | Jul 6, 1982 |
| Priority date | — |
| Expiry date | Sep 30, 2000 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B25/006
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The degree of saturation of a vapor in a chamber such as a curing oven is controlled by sensing the vapor dew point and varying the rate of removal of such vapor from the oven in response to a comparison of the sensed dew point with a predetermined dew point. This comparison may also be effected by comparing the difference between the actual dew point and oven temperature with a predetermined difference and controlling the rate of vapor removal in response to variations between the actual and predetermined differences. Alternately, a predetermined ratio between dew point and oven temperature may be maintained. By controlling the dew point of the vapor, i.e. degree of saturation, condensation in the oven is precluded while still permitting high solvent vapor concentrations which in turn facilitate recovery of solvent exhausted or removed from the oven.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.