Class of E-beam resists based on conducting organic charge transfer salts
US4338392A · kind A · utility
6Cited by
7References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 1981 |
| Grant date | Jul 6, 1982 |
| Priority date | — |
| Expiry date | Jul 28, 2001 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Novel E-beam resists and process for their use are described. These resists are conducting organic charge transfer salts. Films of these materials can be deposited by solvent casting or by sublimation. The deposited film can be made to produce a positive or negative resist image depending on the E-beam energy and exposure time. Exposure of this material to an E-beam produces patterns having differential electrical, optical and solvation properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.