Electrostatic print head
US4338614A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1979 |
| Grant date | Jul 6, 1982 |
| Priority date | — |
| Expiry date | Oct 22, 1999 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G15/323
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improved electrostatic print head is disclosed comprising a corona source, an aperture mask, a slotted focus plane, and a back plane electrode for supporting a moving dielectric print medium. The aperture mask includes two rows of staggered circular apertures which are surrounded by individual aperture electrodes on the side of the mask facing away from the corona source. The side of the aperture mask facing the corona source has a continuous conductive layer thereon which is biased at a fixed potential. The aperture electrodes are selectively pulsed with a control potential to control the flow of ions from the corona source through the two staggered rows of apertures and the slotted focus plane to form any desired dot-matrix latent image on the moving dielectric print medium. The center line of the slotted focus plane is parallel to the center line between the two staggered rows of apertures to focus the ion beams defined by the individual apertures toward the center line of the slot while intensifying the electric field in the imaging region. The slotted focus plane also compresses the cross section of the ion beams defined by the individual apertures into ellipses having thei…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.