Surface processing apparatus utilizing microwave plasma
US4339326A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 19, 1980 |
| Grant date | Jul 13, 1982 |
| Priority date | — |
| Expiry date | Nov 19, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided an apparatus for processing a surface of an object to be processed by utilizing microwave plasma within a plasma-producing chamber, which comprises a microwave power-generating means; a wave guide for transmitting microwaves generated from said microwave power-generating means; a closed vessel constituting the plasma-producing chamber separated from said wave guide by a separating means; an antenna for transmitting microwaves, one end thereof protruding into the wave guide and another end thereof protruding into the closed vessel and a supporting means, for holding or supporting the electroconductive object to be processed, provided within the closed vessel and so attached to the antenna that the antenna and the electroconductive object may be electrically connected to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.