Surface-treating agent adapted for intermediate products of a semiconductor device
US4339340A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1980 |
| Grant date | Jul 13, 1982 |
| Priority date | — |
| Expiry date | Dec 5, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23G1/14
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.