Photosensitive resinous materials containing stilbazolium groups
US4339524A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Apr 14, 1981 |
| Grant date | Jul 13, 1982 |
| Priority date | — |
| Expiry date | Apr 14, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A partially saponified polyvinyl acetate having at least one stilbazolium group-containing photosensitive unit represented by the following general formula: ##STR1## (wherein R.sub.1 is hydrogen atom, an unsubstituted or substituted alkyl group, an alkenyl group or an aralkyl group, R.sub.2 is hydrogen atom or an unsubstituted or substituted alkyl group, Y is a conjugated base of an inorganic or organic acid, m is an integer of 1 to 6, and n is 0 or 1) and an acetal unit represented by the following general formula: ##STR2## (wherein R.sub.3 is hydrogen atom or an alkyl group); the acetal units being contained therein in an amount of approximately 0.5 to 10.0 mol % with respect to mole of the polyvinylalcohol units thereof; the stilbazolium group-containing units being contained therein in an amount of approximately 0.5 to 5.0 mol % with respect to mole of the polyvinylalcohol units thereof; and having a degree of polymerization of approximately 500 to 3,000 and a degree of saponification of approximately 60% or higher. This polyvinyl acetate can be used as photosensitive resinous materials or compositions suitable for the fluorescent screen of a cathode ray tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.