Ion implantation system
US4346301A · kind A · utility
21Cited by
5References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1981 |
| Grant date | Aug 24, 1982 |
| Priority date | — |
| Expiry date | Mar 19, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/02
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plurality of beam generating units 76, 78, 80 and 82 each produces separated rectangular ion beams for implantation onto a targets 52 and 54 rotatively moving therepast. Each rectangular footprint is long in the direction of motion and is scanned transversely to the direction of motion. A plurality of beam generating units can be positioned adjacent to each other to multiply implant targets because of the compact structure of the separated ion source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.