Process for the preparation of an optically transparent and electrically conductive film pattern
US4348255A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 3, 1980 |
| Grant date | Sep 7, 1982 |
| Priority date | — |
| Expiry date | Jul 3, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13439
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An optically transparent and electrically conductive film pattern on a substrate, e.g., an electrooptical display plate provided with a patterned transparent electrode layer, is prepared by a process in which an optically transparent layer of electrically conductive material, coated on the substrate, is removed in predetermined areas by an etching treatment. In this process, the areas of the optically transparent layer on the substrate which are to be removed by etching are printed with an etchant composition which contains an etching agent for the electrically conductive material. The composition is then allowed to remain in contact with the electrically conductive material in order to etch through the areas covered by the composition. Finally, the products formed by reaction of the etchant products formed by reaction of the etchant with the conductive material are removed together with the unspent portions of the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.