Processing of radiation sensitive plates
US4350756A · kind A · utility
18Cited by
10References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 4, 1981 |
| Grant date | Sep 21, 1982 |
| Priority date | — |
| Expiry date | Feb 4, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerizable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms. The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.