Patent · US Expired

High resolution two-layer resists

US4352870A · kind A · utility

17Cited by
4References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 27, 1981
Grant dateOct 5, 1982
Priority date
Expiry dateMar 27, 2001

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/095
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The use of a specific two-layer resist composition with a more sensitive and thicker resist as the lower layer allows the production of lines on the order of 400 A in width separated by spaces on the order of 400 A.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.