High resolution two-layer resists
US4352870A · kind A · utility
17Cited by
4References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 27, 1981 |
| Grant date | Oct 5, 1982 |
| Priority date | — |
| Expiry date | Mar 27, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The use of a specific two-layer resist composition with a more sensitive and thicker resist as the lower layer allows the production of lines on the order of 400 A in width separated by spaces on the order of 400 A.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.