Patent · US Expired

Apparatus for inspecting defects in a periodic pattern

US4360269A · kind A · utility

22Cited by
2References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 30, 1980
Grant dateNov 23, 1982
Priority date
Expiry dateOct 30, 2000

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B27/46
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The apparatus of this invention is used for inspecting defects in a periodic pattern. The apparatus comprises a device for forming a Fourier transformed pattern of the periodic pattern and a filter for passing predetermined spatial frequency ranges of the Fourier transformed pattern. The predetermined spatial frequency ranges are lower than a spatial frequency which coincides with a first order diffraction of the Fourier transformed pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.