Patent · US Expired

Device for measurement of optical scattering

US4360275A · kind A · utility

46Cited by
2References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 11, 1980
Grant dateNov 23, 1982
Priority date
Expiry dateAug 11, 2000

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/474
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

There is disclosed a device for measuring total diffuse optical scattering from the surface of a sample, including a surface having extremely low scatter. A light beam from a laser is directed through an entrance hole in an ellipsoidal reflector and through the vicinity of a first focus of the reflector. The reflector has a first aperture adjacent the first focus for receiving a sample to be measured and a second aperture adjacent a second focus for receiving a photoresponsive means. A sample mounting means is used to position the sample at the first focus and to orient the sample so that the portion of the light beam which is specularly reflected from the sample is directed out of an exit hole located in the reflector diametrically opposite to the entrance hole. A major portion of the light diffusely scattered from the sample into a 2.pi. solid angle (hemisphere) reaches the second aperture either directly or by a single reflection from the reflector. The photoresponsive means such as a photomultiplier is positioned at the second aperture for detecting the magnitude of light scattered. In a specific embodiment, the ellipsoidal reflector is easily and cheaply made from two half-ell…

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.